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NMP Stripping Solution

NMP Stripping Solution, a wet electronic chemical, is used after the completion of the photolithography process. It removes photoresist residues from the silicon wafer surface through dissolution or swelling effects, ensuring an ultraclean wafer surface and preventing interference with subsequent etching or deposition processes.

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NMP Stripping Solution, a wet electronic chemical, is used after the completion of the photolithography process. It removes photoresist residues from the silicon wafer surface through dissolution or swelling effects, ensuring an ultraclean wafer surface and preventing interference with subsequent etching or deposition processes.

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